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filingDate 2009-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2013-05-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2013-05-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-101261171-B1
titleOfInvention Manufacturing Method of Mask Blank Substrate, Manufacturing Method of Reflective Mask Blank, Manufacturing Method of Reflective Mask
abstract In order to provide a method for producing a mask blank substrate, a low thermal expansion glass substrate containing an oxide of titanium (Ti) is polished with an abrasive, and then treated with an aqueous solution containing hydrofluoric acid, and then acidic with a pH of 4 or less. It washes using a solution and washes using an alkaline solution.n n n n Absorber film, glass substrate for mask blank, multilayer reflective film, buffer film, substrate
priorityDate 2008-10-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 47.