http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101256591-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L65-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G61-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G61-12 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G61-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G61-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L65-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2008-11-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2013-04-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2013-04-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101256591-B1 |
| titleOfInvention | Fluorene-based resin polymer comprising a thiol group and a urethane group at the same time, a preparation method thereof and a negative photosensitive resin composition comprising the same |
| abstract | The present invention relates to a fluorene-based resin polymer comprising a thiol group and a urethane group, a method for preparing the same, and a negative photosensitive resin composition comprising the same, wherein the compound of Formula 1, the compound of Formula 2, and the compound of Formula 4 It relates to a fluorene resin polymer by the reaction of.n n n [Formula 1]n n n n n n n n (Wherein, Y is a linear or branched alkylene group of 1 to 10 carbons.)n n n [Formula 2]n n n n n n n n (Wherein X is alkylene, ethylene oxide or propylene oxide of 1 to 3 carbons.)n n n [Formula 4]n n n NCO-Z-NCOn n n (Wherein Z is an alkylene group having 1 to 10 carbon atoms, benzene or cyclohexane).n n n The photosensitive resin composition using the fluorene-based polymer according to the present invention has improved adhesion to the substrate and is excellent in sensitivity and chemical resistance as compared with when the monomolecular thiol compound is separately used as an additive.n n n Fluorene, thiol, urethane, photosensitive resin |
| priorityDate | 2008-11-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 117.