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filingDate 2011-11-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2013-04-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2013-04-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-101254716-B1
titleOfInvention Method for manufacturing a transition substrate having a pattern
abstract The present invention relates to a method for manufacturing a transition substrate having a pattern, and more particularly, to a method for manufacturing a transition substrate having a pattern capable of forming a pattern on the transition substrate without a repeating pattern forming process. To this end, the present invention comprises the ion implantation step of forming an ion implantation layer by implanting ions into the first substrate; A bonding step of contacting the ion implantation surface of the first substrate with a second substrate, contacting the mask substrate having a pattern with the first substrate or the second substrate, and then pressing and bonding the substrate; And separating the first substrate from the second substrate; It provides a transition substrate manufacturing method having a pattern comprising a.
priorityDate 2011-11-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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