http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101249992-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2007-07-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2013-04-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2013-04-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101249992-B1 |
| titleOfInvention | Photosensitive resin composition for organic insulating films and organic insulating film manufactured therefrom |
| abstract | The present invention relates to a photosensitive resin composition for an organic insulating film and an organic insulating film prepared therein, and more particularly, A) a) i) unsaturated carboxylic acid, unsaturated dicarboxylic anhydride, unsaturated compound having a hydroxy group or mixtures thereof, ii) three-dimensional A resin having a molecular weight of 7,000 to 60,000 polymerized with an unsaturated compound comprising a bulky alkylcyclo group having a steric hindrance and an unsaturated compound having an epoxy group; b) an alkali soluble resin consisting of a mixture of resins having a molecular weight of 2,000 to 7,000 polymerized with the same composition as a); B) photosensitive acid generators; C) adhesion promoter; D) Surfactant and E) It is related with the photosensitive resin composition for organic insulating films containing organic solvent, and the organic insulating film manufactured from this.n n n The organic insulating film prepared according to the present invention has a synergistic effect due to a mixture of a resin having a high molecular weight and a resin having a low molecular weight, and has a residual film rate, heat resistance, chemical resistance, photo characteristic, and dielectric constant in a trade-off relationship with each other. In addition, the permeability and the storage stability can be optimally improved and have sufficient margin for each property. Thus, it can be usefully used for forming TFT circuits such as metal films, semiconductor films or protective films of semiconductor devices and liquid crystal display devices.n n n Organic insulating film, interlayer insulating film, photosensitive acid generator, alkali soluble resin |
| priorityDate | 2007-07-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 166.