| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-0002 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3105
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-5096
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0217
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32082
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-345
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3185 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 |
| filingDate |
2005-11-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2013-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2013-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-101244863-B1 |
| titleOfInvention |
Tensile and compressive stress materials for semiconductors |
| abstract |
A stressed film is formed on the substrate. The substrate is disposed in the process region and the plasma is formed from a process gas provided in the process region, the process gas having a silicon containing gas and a nitrogen containing gas. Diluent gases such as nitrogen may also be added. The stressed material in the initial deposition state may be exposed to ultraviolet radiation or electron beam to increase the stress value of the deposited material. Additionally or alternatively, nitrogen plasma treatment may be used to increase the stress value of the material during deposition. Pulsed plasma methods for depositing stressed materials are also described. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102125508-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160090149-A |
| priorityDate |
2004-11-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |