http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101243527-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1811 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F214-182 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F214-186 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F216-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
| filingDate | 2005-01-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2013-03-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2013-03-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101243527-B1 |
| titleOfInvention | Immersion upper layer film forming composition and photoresist pattern forming method |
| abstract | It has sufficient transmittance at the exposure wavelengths of 248 nm (KrF) and 193 nm (ArF), and a film can be formed on the photoresist without causing intermixing with the photoresist film, and is not eluted to water during immersion exposure. The upper layer film which melt | dissolves easily in alkaline developing solution is formed, maintaining a stable film | membrane without. A composition coated on the photoresist film when using a liquid immersion exposure apparatus for irradiating radiation through water between the lens and the photoresist film, wherein the resin and carbon number are dissolved in a developing solution after forming a film that is stable in water upon irradiation. A solvent containing a monohydric alcohol of 6 or less is included, and in particular, the resin includes a resin component having an alcoholic hydroxyl group having a fluoroalkyl group in at least the α-position in its side chain. |
| priorityDate | 2004-01-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 208.