http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101217192-B1

Outgoing Links

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filingDate 2010-11-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2012-12-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2012-12-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-101217192-B1
titleOfInvention Quantum dot coating method
abstract Method for manufacturing a quantum dot solar cell according to the present invention comprises the steps of (a) forming a silicon film mixed with amorphous silicon and nanocrystals on the substrate, (b) etching the amorphous silicon from the silicon film and (c) the amorphous Coating an insulating film on the surface of the nanocrystals remaining on the silicon-etched substrate. In addition, the quantum dot coating method according to the present invention comprises the steps of (a) forming a silicon film mixed with amorphous silicon and nanocrystals on the substrate, (b) etching the amorphous silicon from the silicon film and (c) the amorphous silicon Coating an insulating film on the surface of the nanocrystals remaining on the etched substrate.
priorityDate 2010-11-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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Total number of triples: 28.