| abstract |
The photobase generator of the present invention is represented by the following formula (1):n n n n n n n n Wherein Ar, R, A + and X − are as defined in the detailed description. Since the photobase generator of formula (1) absorbs ultraviolet light of a relatively long wavelength and photolyzes to generate a strong base efficiently, the composition containing the photobase generator and the episulfide compound is easily polymerized by ultraviolet irradiation. Cures. |