| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-128
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0755
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-095
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 |
| filingDate |
2011-04-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2012-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2012-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-101203215-B1 |
| titleOfInvention |
Multilayer photoresist system |
| abstract |
A multilayer photoresist system is provided. In certain aspects, the present invention relates to an undercoat composition for overcoated photoresist, in particular for overcoated silicon-containing photoresist. Preferred underlayer compositions contain one or more resins or other components that impart anti-etching and antireflective properties such as phenyl or other etch resistant groups and other moieties that are antireflective chromophores effective for anthracene or photoresist exposure radiation. At least one resin. |
| priorityDate |
2002-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |