http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101193924-B1

Outgoing Links

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classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-66
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-68
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-3092
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
filingDate 2007-11-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2012-10-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2012-10-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-101193924-B1
titleOfInvention Neutralization method of developing waste liquid containing tetraalkylammonium hydroxide
abstract The present invention is a method of neutralizing by reacting carbon dioxide gas with a tetraalkylammonium hydroxide-containing developing waste solution in which an organic substance derived from a photoresist is dissolved, which effectively prevents the closure by precipitation of the resist in the column during neutralization. An object of the present invention is to provide a neutralization method that is highly filtration of a resist precipitated during neutralization and can be efficiently removed. In the neutralization method of the present invention for achieving the above object, the hydroxide which neutralizes until the pH becomes 11.5 or less by adding carbonic acid gas to the tetraalkylammonium hydroxide-containing developing waste solution of pH 13 or more in which the organic substance derived from photoresist melt | dissolved. In the method for neutralizing a tetraalkylammonium-containing developing waste solution, the addition amount of carbon dioxide gas from the time point when the pH of the developing waste solution reaches 13 to the time point 12 reaches the tetraalkylammonium hydroxide in the developing waste solution when the pH is 13. It is carried out at 0.15 L / hr or less per mole.n n n n Photoresist, Organics, Waste Solution, Neutralization Method, Tetraalkylammonium Hydroxide, TAAH
priorityDate 2006-11-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 29.