http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101193571-B1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4c0d5d15a964bc702120b031e7bb0c48 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D21-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D11-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D11-16 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D11-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D11-06 |
| filingDate | 2011-12-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2012-10-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7d939aed45ffc17881dad2043800e3be http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_025e6e421798b6dd4c256b65af2c8c8c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3d0adb80c6c0c7fb570feaac3b087d61 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c4788950f35770e67b6762e3e1cbee35 |
| publicationDate | 2012-10-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101193571-B1 |
| titleOfInvention | Electrolytic solution for forming aluminum film and method of forming aluminum film using same |
| abstract | The present invention relates to a method for forming an aluminum film applied to a vacuum component for display, such as a semiconductor, and an electrolyte for the same. . The aluminum film forming method includes a degreasing step of degreasing the aluminum surface, an etching step of removing defects on the aluminum surface, and a simmering step of immersing in an acidic solution to remove the smut on the aluminum surface; An anodizing step using an electrolyte solution mixed with sulfuric acid and oxalic acid, the degreasing step using a surfactant, the concentration of the surfactant is 0.5% to 5% by weight, the degreasing time of the degreasing step is 5 minutes To 3 hours, the etching step is performed with an alkaline solution, the concentration of the alkali solution is 0.5% by weight to 5% by weight, the etching temperature of the etching step is 15 ℃ to 50 ℃, the etching time of the etching step is 10 minutes to 3 hours, the concentration of the acidic solution is 3% to 45% by weight in the dispersing step, the temperature of the acidic solution is 5 ℃ to 50 ℃, the dispersing time is 30 seconds to 10 minutes, the sulfuric acid in the anodizing step is 5% to 40% by weight, the oxalic acid is 0.5% to 10% by weight, the anodizing temperature is 0 in the anodizing step And to 50 ℃, anodizing time is 30 minutes to 10 hours using the aluminum film forming method. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150067211-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190026385-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102053320-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200050520-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102143590-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102197887-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101279521-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102032686-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101970043-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-114717628-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190040378-A |
| priorityDate | 2011-12-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 39.