http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101172763-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G63-668 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G63-82 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G63-66 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G61-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 |
| filingDate | 2010-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2012-08-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2012-08-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101172763-B1 |
| titleOfInvention | Copolymers, preparation methods thereof, and resist compositions comprising the same |
| abstract | The copolymer of the present invention includes a repeating unit represented by the following formula (1). [Chemical Formula 1] In Chemical Formula 1, The definitions of R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , n1 and n2 are as described in the specification. When the copolymer is included in the resist composition, high sensitivity, high resolution, high etching resistance, low outgas amount, and good resist pattern can be obtained. |
| priorityDate | 2010-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 114.