http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101167039-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C69-616 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C69-616 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2010-02-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2012-07-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2012-07-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101167039-B1 |
| titleOfInvention | Compound comprising a phenol substituent, a method for preparing the same and a resist composition comprising the same |
| abstract | The present invention provides a novel compound comprising a phenol substituent represented by the following formula (1), a method of preparing the same, and a resist composition comprising the same. [Chemical Formula 1] In the general formula 1 R 1 to R 7 and n 1 are as defined in the detailed description of the invention. The substituent represented by Formula 1 includes an acid dissociable functional group. The compound comprising a phenol substituent represented by the formula (1) constitutes a resist composition together with a photoacid generator to provide a resist composition excellent in sensitivity, resolution, and line edge roughness while allowing ultra fine patterns to be drawn. |
| priorityDate | 2010-02-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 380.