| abstract |
Provided are methods of making sublithographic nanoscale arrays of openings and linear microchannels using self-assembled block copolymers, and films and devices formed therefrom. Embodiments of the present invention may be used as a template or mask to induce alignment of self-assembled block copolymer films to the underlying base film using magnetic template or multilayer approaches to etch openings in the underlying material layer in some embodiments. This results in a multilayer film having an ordered array of nanostructures that can be removed to provide openings in the film.n n n n Nanoscale arrays, openings, self-assembled block copolymers, templates, masks |