http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101157207-B1

Outgoing Links

Predicate Object
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-08
filingDate 2010-04-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2012-06-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2012-06-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-101157207-B1
titleOfInvention Etch Composition for Thin Film Transistor Liquid Crystal Display
abstract The present invention relates to a patterning of multiple films made of a copper film and another metal, which is a metal wiring material for a gate, a source, and a drain electrode, which constitute a thin film transistor (TFT) of a thin film transistor liquid crystal display device. It relates to a composition of the etchant for. The present invention is 3-20% by weight of hydrogen peroxide, 0.1-5% by weight of sulfate, 0.001-2% by weight of fluorine compound, 0.1-5% by weight of chelating agent, 0.1-5% by weight of inorganic acid, 0.01-1% by weight of boron-based compound, additives An etch composition comprising water such that 0.1 to 5% by weight and total weight is 100% by weight can provide an etch rate, a suitable etch amount and an appropriate taper tilt angle suitable for the process. In addition, by increasing the stability aspect, which is a problem of the conventional fruit-based etchant is characterized in that the purchase capacity of the treatment increased.
priorityDate 2010-04-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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