http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101141880-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G18-4854 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G18-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G18-10 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G18-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G18-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G18-48 |
| filingDate | 2005-01-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2012-05-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2012-05-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101141880-B1 |
| titleOfInvention | Polyurethane polishing pads |
| abstract | The polishing pad is suitable for planarizing at least one of semiconductor, optical and magnetic substrates. The polishing pad comprises a cast polyurethane polymer material formed from an isocyanate-terminated reaction product formed from the prepolymer reaction of the prepolymer polyol with the polyfunctional isocyanate. The isocyanate-terminated reaction product has 4.5 to 8.7% by weight of unreacted NCO and is cured with a curing agent selected from the group comprising curable polyamines, curable polyols, curable alcoholamines, and mixtures thereof. The polishing pad contains at least 0.1% by volume of filler or voids.n n n Polishing Pads, Polyurethanes, Semiconductors, Prepolymers, Isocyanates, Casting |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102117902-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20140056116-A |
| priorityDate | 2004-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 61.