abstract |
The present invention relates to a stable acid removal liquid for removing unnecessary tungsten metal formed on or attached to a semiconductor substrate, and a method for removing tungsten metal using the same. More specifically, the present invention relates to a removal liquid of tungsten metal formed or attached to a semiconductor substrate. The removal liquid containing bovine periodic acid and water, and a tungsten metal removal method using the same.n n n n Semiconductor substrate, tungsten metal, removal liquid |