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filingDate 2010-11-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2012-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2012-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-101129422-B1
titleOfInvention Solar cell manufacturing method and solar cell manufactured thereby
abstract The present invention deposits an amorphous silicon layer doped with an impurity on a crystalline silicon substrate and diffuses the impurity into the crystalline silicon substrate through a high temperature annealing process to form an emitter and to form an antireflection film continuously. The present invention relates to a solar cell manufacturing method characterized by reducing a PSG (PhosphoSilicate Glass) removal process and an edge isolation process, which are essential for manufacturing a conventional solar cell. The solar cell manufactured according to the present invention has an effect of improving the photovoltaic conversion efficiency by increasing the p-n junction area to improve the solar light receiving ability, showing a high surface recombination prevention effect.
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