http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101128009-B1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f8b710ca646b2a361dc9d26e7d6efdcf |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E10-50 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-0445 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-18 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-0445 |
| filingDate | 2011-12-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2012-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c1d0e12677e3e0335e53c93139973872 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f2fad84436917c050022798238ec65b0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2053d2b39b6d77550503ed001b22de63 |
| publicationDate | 2012-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101128009-B1 |
| titleOfInvention | Transparent conductive thin film manufacturing method for thin film solar cell |
| abstract | The present invention relates to a method for manufacturing a transparent conductive thin film for a thin film solar cell, and more particularly, transferring a carrier on which a substrate is mounted into a vacuum chamber; Colliding the plasma cations of the argon and oxygen mixed gas generated in the plasma generator with the transferred substrate; Sputtering a conductive oxide on the substrate to form a transparent conductive thin film layer and impinge the plasma cations of the argon and oxygen mixed gas on the transparent conductive thin film layer; And continuously sputtering a conductive oxide on the substrate to form a transparent conductive thin film layer and impinging a plasma cation of an argon and oxygen mixed gas on the transparent conductive thin film layer. According to the manufacturing method of the present invention, before the conductive oxide is coated on the substrate, the cations of the plasma of argon and oxygen mixed gas are first impinged on the substrate to improve the adhesion between the substrate and the transparent conductive thin film to be coated, as well as transparency. While forming the conductive thin film layer, the cations of the plasma of the argon and oxygen mixed gas may collide with the thin film layer to improve the density and electro-optical characteristics of the thin film. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9761344-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104540777-A |
| priorityDate | 2011-12-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 44.