http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101120133-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82B3-0038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B82B3-00 |
| filingDate | 2009-05-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2012-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2012-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101120133-B1 |
| titleOfInvention | Controlled Preparation of Nanostructures on the Surface of Elastic Substrates |
| abstract | The present invention (a) forming an oxide film on the surface of the elastic substrate; (b) bending the elastic substrate on which the oxide film is formed on the cylindrical support to stretch the substrate; And (c) releasing the stretched elastic substrate from the cylindrical support to form a sinusoidal nanostructure surface on the surface of the elastic substrate. And a method of controlling the wavelength or width of a sinusoidal nanostructure surface formed on the surface of an elastic substrate. The method of the present invention is very useful for forming an array of sinusoidal nanostructure patterns on an elastic substrate, and can be formed more quickly in a simpler method. According to the method of the present invention, it is possible to adjust the characteristics (wavelength and width) of the sine wave nanostructure pattern.n n n n Elastic Substrate, Nanostructure, Sine Wave, Wavelength, Width, Control |
| priorityDate | 2009-05-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 22.