http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101114696-B1
Outgoing Links
Predicate | Object |
---|---|
classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-108 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
filingDate | 2004-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2012-02-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2012-02-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-101114696-B1 |
titleOfInvention | How to Control Differential Degradation Rate of Photoresist Composition |
abstract | The present invention relates to a photoresist composition comprising a polymer having at least one polycyclic olefin repeat unit having a desired exo mole%, wherein the repeat unit is derived from a polycyclic olefin monomer having a desired exo mole%. Polymers having such repeating units with the desired exo mole percent control the differential resolution and thus provide improved imaging properties. The invention also relates to monomers having the desired exo mole%. |
priorityDate | 2003-02-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 78.