http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101093363-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31053 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-321 |
| filingDate | 2005-10-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2011-12-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2011-12-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101093363-B1 |
| titleOfInvention | Metal ion-containing CPM composition and its use method |
| abstract | The present invention provides a chemical mechanical polishing composition comprising a abrasive, a metal ion (M) having an M-O-Si bond energy of at least 3 kcal / mol, and water. In addition, the present invention provides a method of polishing a substrate using the above chemical mechanical polishing composition.n n n Chemical mechanical polishing (CMP), abrasives, M-O-Si bonding energy, metal ions, liquid carriers |
| priorityDate | 2004-10-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 63.