http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101082031-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1454 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1409 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 |
| filingDate | 2008-08-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2011-11-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2011-11-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101082031-B1 |
| titleOfInvention | CPM Slurry |
| abstract | The present invention, abrasive; Oxidizing agents; Complex formers; Tetramethylammonium ion type ion additive; Corrosion inhibitors; A CMP slurry comprising a pH adjuster and deionized water. More specifically, the CMP slurry of the present invention includes a tetramethylammonium ion-based ion additive, and relates to a CMP slurry capable of minimizing generation of erosion and the like of the wiring layer. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101298520-B1 |
| priorityDate | 2008-08-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 126.