http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101076172-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-509 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45574 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45553 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 |
| filingDate | 2009-08-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2011-10-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2011-10-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101076172-B1 |
| titleOfInvention | Vapor deposition reactor |
| abstract | The vapor deposition reactor includes: a first injection unit for injecting a first material into a substrate; And a reaction module positioned in the first injection unit and including one or more second injection units for injecting a second material into the substrate. The reaction module may have a structure in which the substrate passes through the reaction module in a relative movement with the substrate. The vapor deposition reactor has an advantage of injecting a plurality of materials into the substrate without exposing the substrate passing through the reaction module to the atmosphere in the chamber. n n Atomic layer, deposition, reactor, ALD, chamber, precursor |
| priorityDate | 2008-08-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 23.