http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101069784-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0226 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0166 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-016 |
| filingDate | 2005-09-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2011-10-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2011-10-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101069784-B1 |
| titleOfInvention | Thick Film Photoresist Composition |
| abstract | The present invention is directed to photosensitive photoresist compositions particularly useful for the formation of thick films comprising surfactants at concentrations ranging from about 2,000 ppm to about 14,000 ppm by weight of the film-forming alkali-soluble resin, photoactive compound, solvent and total photoresist composition. It is about. Preferably the thickness of the photoresist film is greater than 20 microns. The present invention also provides a method of coating and image forming the photosensitive composition of the present invention. |
| priorityDate | 2003-03-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 193.