http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101054548-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N33-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-306 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N31-00 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N31-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N33-00 |
| filingDate | 2006-05-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2011-08-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2011-08-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101054548-B1 |
| titleOfInvention | Silicon concentration measuring device and measuring method in phosphoric acid solution |
| abstract | Continuously, easily and at low cost can be measured continuously, without pretreating the silicon concentration in the high temperature, high concentration phosphoric acid solution circulated in the etching process, and the etching apparatus can be managed in a state where a good treatment can be always performed. It provides a measuring device and a measuring method to ensure that.n n n An apparatus for measuring the concentration of silicon in a phosphoric acid solution used as an etching solution during operation of a semiconductor substrate processing apparatus, the apparatus comprising at least a reaction tank and a concentration measuring tank, wherein the reaction tank is formed from the phosphoric acid solution used in the semiconductor substrate processing apparatus. Hydrofluoric acid is added to the extracted fixed amount of phosphoric acid solution to produce a silicon fluoride compound, and the silicon fluoride compound is further evaporated. The concentration measuring tank further removes the evaporated silicon fluoride compound from the reaction tank. A device for measuring the concentration of silicon in a phosphate solution, which has a mechanism for ventilating through hydrolyzed water and measuring the rate of change of the concentration of silicon in deionized water after ventilation. |
| priorityDate | 2005-05-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 36.