http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101046967-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45574 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-402 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-505 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45565 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-76 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 |
| filingDate | 2007-05-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2011-07-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2011-07-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101046967-B1 |
| titleOfInvention | Process Chamber for Dielectric Gap Fill |
| abstract | A system for forming a dielectric layer on a substrate from a plasma of a dielectric precursor is described. The system may include a deposition chamber, a substrate stage in the deposition chamber to hold the substrate, and a remote plasma generation system connected to the deposition chamber and used to generate a dielectric precursor having one or more reactive radicals. Can be. The system may also include a precursor distribution system having a dual channel showerhead positioned on the substrate stage. The showerhead may include a faceplate having a first set of openings through which the reactive radical precursor enters the deposition chamber and a second set of openings through which the second dielectric precursor enters the deposition chamber. An in-situ plasma generation system may be included to generate plasma in the deposition chamber from the dielectric precursor supplied to the deposition chamber. |
| priorityDate | 2006-05-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 67.