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filingDate 2008-10-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2011-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2011-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-101025932-B1
titleOfInvention Method for manufacturing a transparent oxide electrode using electron beam post treatment
abstract The present invention relates to a method for producing a transparent oxide electrode using electron beam post-treatment. The method for manufacturing a transparent oxide electrode includes: (a) forming a thin film for transparent oxide electrode on a substrate; And (b) irradiating an electron beam to the surface of the transparent oxide electrode thin film, and after (a), an additional heat treatment process is not performed.n n n The method for manufacturing a transparent oxide electrode according to the present invention is excellent in properties even when the substrate is a polymer material that is weak in heat as well as glass, pyrex, quartz by performing a low temperature electron beam irradiation process without performing a high temperature heat treatment process as a post treatment. It is possible to manufacture a transparent oxide electrode.n n n n Electron beam, transparent oxide electrode, heat treatment, post treatment
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