http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101011839-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-114 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2003-10-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2011-01-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2011-01-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101011839-B1 |
| titleOfInvention | Radiation-sensitive resin composition |
| abstract | An object of the present invention is to provide a radiation-sensitive resin composition which can be suitably used as a chemically amplified resist useful for microfabrication using various types of radiation such as far ultraviolet rays such as KrF excimer laser and ArF excimer laser. The radiation sensitive resin composition of this invention is resin containing [A] repeating unit 1-1 represented by following formula (I-1), and [B] a radiation sensitive acid generator (1- (4-n-butoxy Naphthyl) tetrahydrothiophenium nonafluoro-n-butanesulfonate). It may also contain an acid diffusion control agent (phenylbenzimidazole or the like).n n n <Formula I-1>n n n n n n n n Chemically amplified resists, radiation-sensitive compositions, (1- (4-n-butoxynaphthyl) tetrahydrothiopheniumnona fluoro-n-butanesulfonate, phenylbenzimidazole |
| priorityDate | 2002-10-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 1097.