http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101002327-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-1303 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-13 |
| filingDate | 2003-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2010-12-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2010-12-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101002327-B1 |
| titleOfInvention | Plasma chemical vapor deposition equipment |
| abstract | The present invention relates to a plasma chemical vapor deposition apparatus capable of performing a plasma process without preliminary heat treatment of the head of the lift pin, after the substrate is introduced into the chamber without damaging the back surface of the substrate in contact with the head of the lift pin. A susceptor having a vacuum chamber having an inlet and an exhaust port, a substrate on which a reactant formed in the vacuum chamber is deposited, a substrate contact region where the substrate is placed, and a substrate non-contact region outside the substrate contact region, and a rear surface of the substrate A lift pin made of an aluminum alloy whose hardness is lower than that of the substrate by preheating, and a shadow corresponding to the substrate non-contact area of the susceptor in a downward direction covering the edge of the upper surface of the substrate in a lower direction. Characterized by including a frame.n n n n Hardness, lift pins, center golf tee, susceptor |
| priorityDate | 2003-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 28.