http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101002164-B1
Outgoing Links
Predicate | Object |
---|---|
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C49-167 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C45-78 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B32-80 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C45-30 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B31-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C51-58 |
filingDate | 2006-09-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2010-12-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2010-12-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-101002164-B1 |
titleOfInvention | Process for preparing carbonyl fluoride |
abstract | The present invention provides a method for producing COF 2 safely and continuously without the use of highly toxic raw materials such as phosgene or other difficult to obtain raw materials, which is cheaper and more efficient, and without the risk of explosion. Tetrafluoroethylene gas and oxygen gas are introduced into the reaction vessel, and in the absence of nitrogen gas, it is heated and reacted in the gas phase to produce carbonyl fluoride. The reaction vessel is preferably a conventional reaction tube. As the tetrafluoroethylene gas, crude or purified tetrafluoroethylene gas obtained by heating the HCFC-22 gas and pyrolyzing may be used. According to the present invention, COF 2 useful as a cleaning gas of a CVD apparatus (chemical vapor deposition method) can be produced at low cost, efficiently and safely.n n n Tetrafluoroethylene, HCFC-22, Carbonyl Fluoride |
priorityDate | 2005-09-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 102.