http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100996652-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C381-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2003-10-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2010-11-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2010-11-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100996652-B1 |
| titleOfInvention | Photoacid generator having a sulfonate group in the furyl dioxime matrix, and a resist composition comprising the same |
| abstract | The present invention relates to a photoacid generator having a sulfonate group in a Furildioxime matrix, and a resist composition comprising the same. The present invention includes a new photoacid generator in a composition of a chemically amplified resist, and exhibits high transparency to exposure light and excellent quantum yield and line edge roughness.n n n n Furyldioxime, photoacid generator, chemically amplified resist composition, high permeability, high quantum yield, line edge roughness |
| priorityDate | 2003-10-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 118.