http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100993046-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-2855 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-3407 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-3457 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-3435 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-768 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-54 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-35 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D5-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-285 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34 |
| filingDate | 2002-11-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2010-11-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2010-11-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100993046-B1 |
| titleOfInvention | Self-ionization and Inductively Coupled Plasma for Sputtering and Resputtering |
| abstract | Disclosed are a magnetron sputter reactor 410 and a method of using a magnetron sputter reactor in which SIP sputtering and ICP sputtering are facilitated. In another chamber 412, an array of auxiliary magnets is disclosed disposed along sidewalls 414 of the magnetron sputter reactor on one side from the target toward the substrate. Preferably the magnetron 436 has a stronger external magnetic pole 442 with a first polarity surrounding the weaker internal magnetic pole 440 with a second polarity, where both the internal and external magnetic poles are yoke ( 444, the magnetron 436 rotates about the axis 438 of the chamber using the rotating means 446, 448, 450. Preferably the auxiliary magnets 462 have a first polarity to attract the unbalanced magnetic field 460 towards the substrate 424, the substrate 424 being on the pedestal 422 to which the power 454 is supplied. . Argon 426 is supplied through valve 428. The target 416 is supplied with power 434. |
| priorityDate | 2001-11-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 31.