http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100984177-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6833 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-68757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H02N13-00 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-68 |
| filingDate | 2008-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2010-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2010-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100984177-B1 |
| titleOfInvention | Electrostatic chuck and plasma ion implantation device using the same |
| abstract | The electrostatic chuck according to the present embodiment has a large number of bias protrusions by forming a plurality of bias protrusions integrally with the body of the electrostatic chuck, and between the bias protrusions, a monopolar arrangement or a multipole arrangement structure electrode for providing electrostatic force is provided. By installing and providing a good electrostatic force, it is possible to improve the manufacturing efficiency of the electrostatic chuck and the operating performance of the manufactured electrostatic chuck. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10062598-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106463445-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10930543-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2015179081-A1 |
| priorityDate | 2008-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 21.