http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100981315-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-108 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2009-11-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2010-09-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2010-09-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100981315-B1 |
| titleOfInvention | Positive resist composition and pattern formation method using same |
| abstract | (A) a compound having a monocyclic or polycyclic alicyclic hydrocarbon structure, which can be decomposed by the action of an acid to increase solubility in an alkaline developer, and (B) a compound capable of generating an acid upon treatment with one of active light and radiation; And (F) a positive resist composition comprising a surfactant containing a fluorine atom in an amount of 30 to 60 mass% and a pattern forming method using the same.n n n n Positive resist composition, pattern formation method |
| priorityDate | 2004-10-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 659.