http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100977940-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate | 2003-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2010-08-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2010-08-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100977940-B1 |
| titleOfInvention | Methanol-containing Silica-based CPM Composition |
| abstract | The present invention provides a polishing composition comprising (a) a silica abrasive, (b) methanol and (c) a liquid carrier, having a pH of 1 to 6 and having colloidal stability. The present invention also provides a method of polishing a substrate comprising a silicon-based dielectric layer using the polishing composition. The present invention also provides a method of stabilizing silica abrasive in the polishing composition by contacting the abrasive with methanol. n n n Polishing composition, methanol, colloidal stability |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20180135029-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102298238-B1 |
| priorityDate | 2002-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 90.