http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100974034-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02052 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02068 |
| classificationIPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D11-00 |
| filingDate | 2003-11-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2010-08-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2010-08-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100974034-B1 |
| titleOfInvention | Cleaning solution and cleaning method using the same |
| abstract | The present invention is the following general formula (1)n n n (General formula 1)n n n n n n n n (Wherein Y 1 and Y 2 represent a lower alkylene group, n represents an integer of 0 to 4, at least 4 of R 1 to R 4 and n R 5 represent an alkyl group having a phosphonic acid group and the rest) Represents a alkyl group.) A cleaning liquid for a semiconductor substrate containing a chelating agent or a salt thereof, an alkali compound, and each component of pure water, and having a metal wiring having a pH of 8 to 13, and using the same The present invention relates to a cleaning method, and even when used after a step using an alkaline abrasive or an alkaline etching solution, problems such as difficulty in gelling and removal of fine particles on the surface of the substrate or occurrence of surface roughness on the surface of the semiconductor substrate are likely to occur. Cleaning liquid capable of efficiently removing fine particles (particles) and various metal-derived impurities on the surface of a semiconductor substrate and a semiconductor using the same It provides a method for cleaning the plate.n n n Silicon Wafer, Cleaning Liquid |
| priorityDate | 2002-11-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 106.