http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100972829-B1
Outgoing Links
Predicate | Object |
---|---|
classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2258-0216 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-75 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-265 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-26 |
filingDate | 2008-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2010-08-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2010-08-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-100972829-B1 |
titleOfInvention | Waste gas treatment system |
abstract | Disclosed is a waste gas treatment apparatus including human hazardous substances, pollutants, and the like used in the manufacture of semiconductors and flat panel displays. The waste gas treating apparatus according to the present invention comprises a heat treatment unit for purifying waste gas by using an arc discharge, a chamber for fixing the heat treatment unit, and providing a processing space in which the waste gas is processed, outside the processing space inside the chamber. It is provided, comprising a heat insulating material for blocking the heat inside the processing space to escape to the outside and a gas cooling unit for cooling the gas purified through the chamber. Therefore, according to the present invention, the heat of the processing space in which the waste gas is thermally decomposed is minimized in the process of cooling the outer wall of the chamber, thereby maintaining an appropriate high temperature in the reaction space and consequently improving the waste gas processing efficiency. have.n n n n Semiconductor, Display, Waste Gas Treatment, Chamber, Plasma, Insulation |
priorityDate | 2008-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 17.