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filingDate 2008-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2010-07-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2010-07-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-100971066-B1
titleOfInvention Fluorine-containing compound, fluorine-containing polymer compound, negative type resist composition and pattern formation method using the same
abstract The present invention provides a chemically amplified negative resist composition which is highly transparent to Kr excimer laser light or ArF excimer laser light, has high resolution, is free of swelling, and gives a resist pattern having a rectangular cross-sectional shape. Let's make it a task.n n n The present invention also relates to a fluorine-containing polymer compound having a weight average molecular weight of 1,000 to 1,000,000 comprising a repeating unit represented by the following formula and a repeating unit having an alcoholic hydroxyl group.n n n n n n n n (In the formula, R 3 is a fluorine atom or a fluorinated alkyl group, W represents a divalent connecting group. R 4, R 5 and R 6 are independently hydrogen atom, a fluorine atom or a monovalent organic group with each other or are mutually combined You may form a ring.)
priorityDate 2007-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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