abstract |
Metal oxide thin film pattern forming method using a nanoimprint according to an embodiment of the present invention, the step of coating a photosensitive metal-organic precursor solution on a substrate, the photosensitive metal-organic precursor coating layer with a pattern patterned to have an uneven structure Pressurizing, irradiating the pressurized photosensitive metal-organic precursor coating layer with ultraviolet rays to form a cured metal oxide thin film pattern, and removing the patterned mold from the metal oxide thin film pattern. |