| abstract |
The washing water supply unit 50 for supplying the alkaline washing liquid, the high pressure air supply unit 40 for supplying the high pressure air, and the supplied washing water are mixed with high pressure air to form a mist, and sprayed onto the semiconductor wafer W. 2 fluid nozzles 30 are provided.n n n n Semiconductor wafer, fluid nozzle, air supply, cleaning water supply |