http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100949250-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F3-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1409 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate | 2007-10-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2010-03-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2010-03-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100949250-B1 |
| titleOfInvention | Metal CPM Slurry Composition and Polishing Method Using the Same |
| abstract | The present invention relates to a metal polishing CMP slurry composition, and more particularly, to a metal polishing comprising a copolymer having an average molecular weight of 600,000 to 1,300,000 and a copolymerization ratio of acrylic acid and acrylamide monomer 1:30 to 30: 1. A CMP slurry composition.n n n According to the present invention, it is possible to provide a polishing composition exhibiting non-Prestonian behavior, which can minimize dishing and obtain excellent flatness.n n n n Metal, Abrasive, CMP Slurry, Acrylic Acid, Acrylamide, Copolymer, Non-Prestonian Behavior |
| priorityDate | 2007-10-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 111.