http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100948213-B1
Outgoing Links
Predicate | Object |
---|---|
classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-108 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C37-055 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L61-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
filingDate | 2008-02-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2010-03-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2010-03-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-100948213-B1 |
titleOfInvention | Photosensitive compound, photosensitive composition, method of forming resist pattern and method of manufacturing device |
abstract | The photosensitive compound contains two or more structural units represented by the following general formula (1) in a molecule:n n n [General Formula (1)]n n n n n n n n Wherein R 1 to R 5 are selected from the group consisting of a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an acetoxy group, a phenyl group, a naphthyl group, and an alkyl group in which some or all hydrogen atoms are replaced with fluorine atoms; Substituted or unsubstituted phenylene group or substituted or unsubstituted naphthylene group). |
priorityDate | 2007-02-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 156.