http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100948212-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C37-055 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C49-84 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C225-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L61-14 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2008-02-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2010-03-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2010-03-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100948212-B1 |
| titleOfInvention | Photosensitive compound, photosensitive composition, method of forming resist pattern and method of manufacturing device |
| abstract | The photosensitive compound according to the present invention contains two or more structural units represented by the following general formula (1) in a molecule:n n n n n n n n R 1 to R 10 are selected from the group consisting of a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, a phenyl group, a naphthyl group, and an alkyl group in which some or all of the hydrogen atoms are replaced with fluorine atoms; X is a substituted or unsubstituted phenylene group, or a substituted or unsubstituted naphthylene group. |
| priorityDate | 2007-02-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 158.