| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-108 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate |
2003-03-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2009-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2009-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-100933911-B1 |
| titleOfInvention |
Positive resist composition |
| abstract |
(A) a compound which generates an acid by irradiation of actinic light or radiation; (B) a resin which is insoluble or poorly soluble in alkali and becomes alkali-soluble by the action of an acid; And (D) a chain compound having three or more groups selected from a hydroxyl group and a substituted hydroxyl group. |
| priorityDate |
2002-03-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |