http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100928184-B1

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C33-38
filingDate 2009-01-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2009-11-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_00459dfd923c0e5035468eabe97bf45d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ac511dbf8c77fa868df27b35b8b9803e
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publicationDate 2009-11-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-100928184-B1
titleOfInvention Highly durable replica mold for nanoimprint lithography and its manufacturing method
abstract The present invention provides a replica mold that has high durability against chemical, thermal and mechanical stress, can be very suitably used for various nanolithography techniques including thermal NIL and optical NIL, and a method for easily and inexpensively producing a replica mold. do.n n n Formula 1:n n n n n n n n A replica mold is produced using an organic-inorganic hybrid resin having a Si-O-Ti network represented by (wherein R is a hydrocarbon group having 1 to 3 carbon atoms and PM is a residue of propylmethacrylic acid).
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10144155-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2013115570-A1
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102212605-B1
priorityDate 2008-09-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 41.