http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100927414-B1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ccecfa656987a7ded7365d3ec6ac1484 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2201-46135 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2103-008 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2201-46175 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2201-4615 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2201-4614 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-4608 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-48 |
| filingDate | 2009-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2009-11-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5b15873ea788f14d7928d270c0bded97 |
| publicationDate | 2009-11-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100927414-B1 |
| titleOfInvention | Plasma treatment apparatus and treatment method |
| abstract | The present invention relates to a plasma processing apparatus and a processing method.n n n Plasma processing apparatus according to the present invention is a plasma processing apparatus for removing the microorganisms contained in the ballast water by plasma-processing the ballast water, having a voltage of 20000 to 40000 V, current of 0.7 to 1.5 mA, frequency of 10 to 30KHz A first power supply unit generating a first high voltage pulse; A second power supply unit connected in parallel with the first power supply unit and generating a second high voltage pulse having a voltage of 3000 to 5000 V, a current of 200 to 330 mA, and a frequency of 50 to 70 Hz; A discharge electrode discharged in water by using a first high voltage pulse and a second high voltage pulse generated from the first power supply unit and the second power supply unit; And a first switching element and a second switching element connected between the discharge electrode, the first power supply unit, and the second power supply unit, respectively, to switch off the supply of the first high voltage pulse and the second high voltage pulse. After supplying to the discharge electrode and generating an conduction channel by generating an arc plasma between the discharge electrodes, a second high voltage pulse is supplied to the discharge electrode to maintain the arc plasma for a predetermined time. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101458412-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101280445-B1 |
| priorityDate | 2009-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 26.