http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100919659-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67098 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-68714 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-20 |
| filingDate | 2007-08-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2009-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2009-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100919659-B1 |
| titleOfInvention | Semiconductor Manufacturing Apparatus |
| abstract | Disclosed is a semiconductor manufacturing apparatus for processing a pair of semiconductor substrates in a semiconductor manufacturing apparatus by facing each other in a granular state. The semiconductor manufacturing apparatus according to the present invention includes a reaction chamber 24 providing a closed process space; Boat 22 for mounting / drawing a pair of wafers 100 facing the reaction chamber-The boat 22 has a pair of susceptors having a ring shape with an open center in which a pair of wafers are mounted. 10) and a pair of rotary tables 18 rotatably supported by a plurality of support rollers 20, each of which is equipped with a pair of susceptors 10; A pair of heater units 80 disposed on the rear surface of the pair of semiconductor substrates 100 to perform a predetermined epitaxial process in the reaction chamber 24; And a process gas nozzle 76 provided to surround the upper periphery of the pair of semiconductor substrates 100 for supplying the process gas, and the size of the semiconductor substrate side end of the process gas nozzle 76. It is larger than the size of the opposite end part of a semiconductor substrate, Comprising: It comprises the exhaust gas nozzle 78 installed so that the lower periphery of a pair of semiconductor substrate 100 may exhaust the process gas. |
| priorityDate | 2007-08-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 15.