http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100917087-B1

Outgoing Links

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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B15-203
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B15-206
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B29-06
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B29-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B15-00
filingDate 2001-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2009-09-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2009-09-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-100917087-B1
titleOfInvention Nitrogen-doped silicon with virtually no oxidation-induced lamination flaws
abstract The present invention relates to a single crystal silicon, ingot or wafer form, wherein the bacones are major intrinsic point defects, are substantially free of oxide deposit defects, and have axisymmetric regions doped with nitrogen to stabilize the oxygen precipitated nucleus therein, and the process of making them. It's about.n n n n Single crystal silicon, epitaxial layer, baconic defect, axisymmetric region, oxygen concentration, nitrogen concentration, nitrogen doping
priorityDate 2000-09-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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Total number of triples: 27.