http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100912154-B1

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filingDate 2007-02-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2009-08-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2009-08-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-100912154-B1
titleOfInvention Method of manufacturing magnetoresistive effect element
abstract A method of manufacturing a magnetoresistive element in which a magnetization fixing layer, a nonmagnetic intermediate layer, and a magnetization free layer are sequentially stacked is disclosed. The method comprises the steps of forming at least a portion of a magnetic layer that will be either of the magnetization anchor layer and the magnetization free layer; Forming a functional layer on at least a portion of the magnetic layer, the functional layer comprising at least one of oxide, nitride, and fluoride; Removing a portion of the functional layer by exposing the functional layer to either ion beam or plasma irradiation.n n n n Magnetoresistive element, Current-In-Plane-Giant-Magnetoresistance (CIP-GMR), Tunneling Magnetoresistance (TMR), Current-Perpendicular-to-Plane (GPP), Half metal (half metal)
priorityDate 2006-02-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 28.